According to a journal on the official website of the Chinese Academy of Sciences (CAS), the Laboratory of Information Optics and Optoelectronic Technology at the Shanghai Institute of Optics and Fine Mechanics (SIOM), CAS has recently made important progress in computational lithography. The laboratory proposed a fast optical proximity effect correction (OPC) technique based on virtual edges and pixelated mask patterns with double sampling rate, which can effectively improve the lithography resolution and increase the process window. Such technology is considered to be a new driving force for the continued development of IC chips in accordance with Moore’s Law
